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Allows emplacement of reactive barriers at depths of 100 feet or greater |
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Lowers waste disposal costs by reducing the amount of spoils generated |
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Promotes increased permeability in soil around the barrier |
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Eliminates risks associated with open excavations |
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NASA's Deep Wall Emplacement Method can be used to install iron barriers at a variety of sites contaminated by chlorinated compounds. These sites may include:
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Electronic Manufacturers |
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Plating Facilities |
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Chemical Manufacturers |
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Dry Cleaners |
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Sanitary and Industrial Landfills |
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Automobile and Aircraft Maintenance Facilities |
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Semiconductor Manufacturers |
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Solvent Recycling Facilities |
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